DocumentCode :
3137042
Title :
Surface microstructure predictions from atomistic rule set cellular automata
Author :
Zacate, M.O. ; Atkinson, K.J.W. ; Grimes, R.W. ; Lee, P.D.
Author_Institution :
Imperial Coll., London Univ., UK
Volume :
2
fYear :
1999
fDate :
1999
Firstpage :
1197
Abstract :
When a specific microstructure is required, if the preparation variables increase beyond a few, it is very difficult and expensive to determine the optimum conditions experimentally. Consequently there is considerable interest in predicting conditions via computer simulations. Since ultimately, microstructure depends on processes occurring at the atomistic level, to be fully transferable, it is desirable that such a model is atomistically-based. This should also allow us to include the role of all types of chemical and crystallographic defects explicitly. In this study, we begin by calculating the energetics associated with the way in which individual gas atoms interact with a specific metal surface. Both perfect and defective metal surfaces are considered. The energetics are translated into rule sets which form the basis of the cellular automata. The rule sets involve both temperature and gas atom flux as variables. The result is a model which can quickly, explicitly describe the evolution of 104 surface sites over 10-6 seconds with very modest computing facilities. In the simulations, the formation and growth of domains which exhibit critical behavior are observed. That is, the rate of growth is not a well-behaved function of temperature or flux but exhibits a region in which the rate of growth suddenly falls to zero. Surface defects are also predicted and have a dramatic effect on growth rates
Keywords :
cellular automata; crystal defects; crystal microstructure; digital simulation; physics computing; surface structure; atomistic rule set cellular automata; cellular automata; chemical defects; crystallographic defects; gas atoms; metal surface; surface microstructure predictions; Chemicals; Computational modeling; Computer simulation; Crystalline materials; Crystallography; Educational institutions; Microstructure; Temperature; Testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Intelligent Processing and Manufacturing of Materials, 1999. IPMM '99. Proceedings of the Second International Conference on
Conference_Location :
Honolulu, HI
Print_ISBN :
0-7803-5489-3
Type :
conf
DOI :
10.1109/IPMM.1999.791549
Filename :
791549
Link To Document :
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