DocumentCode :
313724
Title :
Modeling and filtering of optical emission spectroscopy. Data for plasma etching systems
Author :
Rangan, Sundeep ; Spanos, Costas ; Poolla, Kameshwar
Author_Institution :
Dept. of Electr. Eng., California Univ., Berkeley, CA, USA
Volume :
1
fYear :
1997
fDate :
4-6 Jun 1997
Firstpage :
627
Abstract :
We present a novel filter for optical emission spectroscopy (OES) data in plasma etch control applications. The filter is based on principal component analysis and jump linear filtering. The filter is demonstrated on a commercial multilayer TiN/Al(0.5% Cu)/TiN/SiO2 etch process
Keywords :
optical filters; plasma diagnostics; sputter etching; TiN-AlCu-TiN-SiO2; TiN/AlCu/TiN/SiO2 multilayer; jump linear filtering; model; optical emission spectroscopy; plasma etching control; principal component analysis; Etching; Filtering; Nonlinear filters; Optical control; Optical filters; Plasma applications; Principal component analysis; Spectroscopy; Stimulated emission; Tin;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
American Control Conference, 1997. Proceedings of the 1997
Conference_Location :
Albuquerque, NM
ISSN :
0743-1619
Print_ISBN :
0-7803-3832-4
Type :
conf
DOI :
10.1109/ACC.1997.611875
Filename :
611875
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=313724
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