• DocumentCode
    3138451
  • Title

    Analysis of MOS resistive gate transistors for application in analog multipliers

  • Author

    du Plessis, M. ; Schieke, P.

  • Author_Institution
    Carl & Emily Fuchs Inst. for Microelectron., Pretoria Univ., South Africa
  • fYear
    1999
  • fDate
    1999
  • Firstpage
    224
  • Lastpage
    227
  • Abstract
    Placing two contacts on the gate electrode of a MOS transistor allows one to establish a lateral electric field in the resistive gate. The electric field in the gate electrode modifies the inversion charge density and potential profile in the channel of the device, thus modulating the drain current. It was found that a transistor with two gate contacts (one near the source and the other near the drain) above a rectangular active channel region, combined with a narrowing of the gate electrode width going from source to drain, can be used as a multiplying device. This device was simulated and it is shown that a single transistor can be used as a square-law device. Placing two transistors in parallel leads to four quadrant analog multiplication. The square-law and multiplier circuits have a differential input dynamic range of several volts. Device simulation results show that resistive gate devices with nonrectangular gate geometries can be used in novel analog multiplier applications
  • Keywords
    CMOS analogue integrated circuits; MOSFET; analogue multipliers; integrated circuit modelling; semiconductor device models; MOS resistive gate transistors; MOS transistor; analog CMOS design; analog multipliers; device simulation; drain current; four quadrant analog multiplication; gate electrode; inversion charge density; lateral electric field; multiplying device; nonrectangular gate geometries; potential profile; rectangular active channel region; source; square-law device; Africa; Circuit simulation; Electrodes; Geometry; Immune system; MOSFETs; Microelectronics; Resistors; Semiconductor device modeling; Threshold voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Optoelectronic and Microelectronic Materials Devices, 1998. Proceedings. 1998 Conference on
  • Conference_Location
    Perth, WA
  • Print_ISBN
    0-7803-4513-4
  • Type

    conf

  • DOI
    10.1109/COMMAD.1998.791626
  • Filename
    791626