• DocumentCode
    3138807
  • Title

    Hierarchical feature based matching for motion correspondence

  • Author

    Venkateswar, V. ; Chellappa, R.

  • Author_Institution
    Comput. Sci. Center, Texas Instruments, Dallas, TX, USA
  • fYear
    1991
  • fDate
    7-9 Oct 1991
  • Firstpage
    280
  • Lastpage
    285
  • Abstract
    The authors design a feature based motion correspondence system. They propose a hierarchical grouping process that groups line segments into more complex structures that are easier to match. The hierarchy consists of lines, vertices, edges and surfaces. Matching starts at the highest level of the hierarchy (surfaces) and proceeds to the lowest (lines). Higher level features are easier to match, because they are fewer in number and more distinct in form. These matches then constrain the matches at lower levels. Perceptual and structural relations are used to group matches into islands of certainty. A Truth Maintenance System (TMS) is used to enforce grouping constraints and eliminates inconsistent match groupings. The TMS is also used for reasoning in the presence of uncertainty and to carry out logic revisions necessitated by additions, deletions and confirmations of hypotheses. The hierarchical matching process results in line matches as well as point matches. These then can be used as an input to a motion estimation algorithm
  • Keywords
    feature extraction; motion estimation; truth maintenance; uncertainty handling; Truth Maintenance System; edges; feature based motion correspondence; grouping constraints; hierarchical grouping process; hierarchical matching process; islands of certainty; line matches; line segments; logic revisions; motion estimation; point matches; structural relations; surfaces; vertices; Computer science; Educational institutions; Image sequences; Instruments; Layout; Logic; Motion estimation; Pattern matching; Topology; Uncertainty;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Visual Motion, 1991., Proceedings of the IEEE Workshop on
  • Conference_Location
    Princeton, NJ
  • Print_ISBN
    0-8186-2153-2
  • Type

    conf

  • DOI
    10.1109/WVM.1991.212774
  • Filename
    212774