• DocumentCode
    3139486
  • Title

    High-power and high-efficiency GaN HEMT amplifiers

  • Author

    Joshin, Kazukiyo ; Kikkawa, Toshihide

  • Author_Institution
    Fujitsu Ltd., Atsugi
  • fYear
    2008
  • fDate
    22-24 Jan. 2008
  • Firstpage
    65
  • Lastpage
    68
  • Abstract
    We report a current status of high-power GaN HEMTs for high-power and high-efficiency amplifiers with higher efficiency by 5% especially at a backed-off region than the conventional GaN HEMTs. First, we introduce our specific device structure GaN HEMT with dispersion-free I-V characteristics, low Idsq-drift and high reliability. Record average drain efficiency of over 50% and linear gain of 17.2 dB were obtained at an output power of 45 dBm and 2.5 GHz. Next, we discuss their reliability with high-temperature life tests resulting in their estimated life of over 1 times 106 hours at Tj of 200degC. Finally, we describe the next generation GaN HEMTs for millimeter-wave applications.
  • Keywords
    III-V semiconductors; UHF field effect transistors; UHF power amplifiers; gallium compounds; high electron mobility transistors; wide band gap semiconductors; GaN; HEMT amplifiers; dispersion-free I-V characteristics; efficiency 5 percent; frequency 2.5 GHz; gain 17.2 dB; high-efficiency amplifiers; high-power amplifiers; high-temperature life tests; temperature 200 degC; Buffer layers; Gain; Gallium nitride; HEMTs; High power amplifiers; Millimeter wave communication; Millimeter wave radar; Power amplifiers; Power generation; Silicon compounds; HEMT; millimeter wave; power amplifiers;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Radio and Wireless Symposium, 2008 IEEE
  • Conference_Location
    Orlando, FL
  • Print_ISBN
    978-1-4244-1462-8
  • Electronic_ISBN
    978-1-4244-1463-5
  • Type

    conf

  • DOI
    10.1109/RWS.2008.4463429
  • Filename
    4463429