Title :
Processing of porous and dense PZT thick films on Al2O 3 substrates
Author :
Fernandez, J.F. ; Nieto, E. ; Moure, C. ; Duran, P.
Author_Institution :
Electroceramics Dept., Inst. de Ceramica y Vidrio, Madrid, Spain
Abstract :
The processing of porous PZT thick film ceramics on Al2O3 has been studied. The films were screen-printed from a thixotropic ink of PZT with a 58% solids content. The thick films were sintered between 1000°C and 1100°C for two hours. The sintered films show a 10 μm thickness and a average pore diameter ranging from 1 to 1.6 μm. The PZT forms a continuous skeleton that can be filled with the desired polymer. Dense and continuous PZT films were fabricated by screen-printing PZT ink on previously electroded Al2O3 substrates with Ag/Pd 70/30 paste. Densification of the PZT was obtaining by sintering near the liquidus temperature of the Ag-Pd system
Keywords :
alumina; crystal microstructure; densification; lead compounds; piezoceramics; porous materials; sintering; thick films; 1.0 to 1.6 micron; 10 micron; 1000 degC; 1100 degC; 2 hour; Ag-Pd system; Al2O3; Al2O3 substrates; PZT; PZT/polymer composite; PbZrO3TiO3; average pore diameter; ceramics; dense PZT thick films; densification; liquidus temperature; porous films; processing; screen-printed films; sintering; thixotropic ink; Temperature; Thick films;
Conference_Titel :
Applications of Ferroelectrics, 1994.ISAF '94., Proceedings of the Ninth IEEE International Symposium on
Conference_Location :
University Park, PA
Print_ISBN :
0-7803-1847-1
DOI :
10.1109/ISAF.1994.522295
