• DocumentCode
    3141288
  • Title

    Micropatterning process of ferroelectric oxides by irradiation of an electron beam on metal naphthenate films

  • Author

    Okamura, Soichiro ; Kakimi, Atsushi ; Yagi, Yukie ; Mori, Katsumi ; Tsukamoto, Takeyo

  • Author_Institution
    Dept. of Appl. Phys., Sci. Univ. of Tokyo, Japan
  • fYear
    1991
  • fDate
    33457
  • Firstpage
    62
  • Lastpage
    65
  • Abstract
    Fine micropatterns with linewidth of 0.35 μm were fabricated by irradiation with an electron beam of metal naphthenate films, being precursors of ferroelectric oxides, and development with a solvent. Relatively large patterns were crystallized into the single phase Bi4Ti3O12 with c-axis orientation by successive heat-treatment at 800°C. Micropatterns with linewidth of 1 μm were crystallized into single crystals and their volume was reduced to 15% by the heat-treatment of PZT and Bi4Ti3 O12 thin films formed by the dipping pyrolysis method, which is the base of this patterning process. Good ferroelectric properties were exhibited; the remanent polarization Pr and the coercive field Ec were 24 μC/cm2 and 39 kV/cm for PZT, and 1.6 μC/cm2 and 24 kV/cm for Bi4 Ti3O12, respectively
  • Keywords
    bismuth compounds; coating techniques; dielectric polarisation; electron beam lithography; ferroelectric thin films; heat treatment; lead compounds; piezoceramics; pyrolysis; 0.35 micron; 1 micron; 800 degC; Bi4Ti3O12; PZT; PbZrO3TiO3; c-axis orientation; coercive field; crystallization; dipping pyrolysis method; electron beam irradiation; ferroelectric oxides; ferroelectric properties; heat-treatment; linewidth; metal naphthenate films; micropatterning process; remanent polarization; single phase; Crystallization; Dry etching; Electron beams; Fabrication; Ferroelectric films; Ferroelectric materials; Semiconductor thin films; Silicon; Solvents; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Applications of Ferroelectrics, 1994.ISAF '94., Proceedings of the Ninth IEEE International Symposium on
  • Conference_Location
    University Park, PA
  • Print_ISBN
    0-7803-1847-1
  • Type

    conf

  • DOI
    10.1109/ISAF.1994.522298
  • Filename
    522298