DocumentCode
3144106
Title
What triggers NBTI? An “on the fly” electron spin resonance approach
Author
Ryan, J.T. ; Lenahan, Patrick M. ; Grasser, Tibor ; Enichlmair, H.
Author_Institution
Pennsylvania State Univ., University Park, PA, USA
fYear
2009
fDate
18-22 Oct. 2009
Firstpage
42
Lastpage
45
Abstract
We have developed a means to perform "on the fly" electron spin resonance (ESR) measurements of NBTI defect generation. The approach permits ESR measurements to be performed during NBTI stress void of any recovery contamination. We demonstrate that elevated temperature (100°C) and modest negative polarity oxide electric field (<5MV/cm) generates ESR spectra of E\´ oxide defects. (These defects are holes trapped in oxygen vacancies.) When similar measurements are made at elevated temperature and no oxide bias, E\´ center spectra are not observed. When ESR measurements are made with identical negative oxide bias at room temperature, E\´ center spectra are not observed. Furthermore, we demonstrate that the NBTI induced E\´ center spectrum disappears, a recovery phenomena, when the NBTI stressing condition is removed. These observations indicate that NBTI is triggered by inversion layer hole capture at an E\´ precursor site (an oxygen vacancy) which then leads to the depassivation of nearby interface states (Pb centers).
Keywords
crystal defects; paramagnetic resonance; semiconductor device measurement; semiconductor device reliability; CMOS technology; E center spectra; ESR measurements; NBTI defect generation; elevated temperature; inversion layer hole capture; negative bias temperature instability; negative polarity oxide electric field; on the fly electron spin resonance; oxygen vacancy; p-MOSFET; polarity oxide electric field; temperature 1000 °C; Contamination; Electric variables measurement; Interface states; Niobium compounds; Paramagnetic resonance; Performance evaluation; Pollution measurement; Stress measurement; Temperature; Titanium compounds;
fLanguage
English
Publisher
ieee
Conference_Titel
Integrated Reliability Workshop Final Report, 2009. IRW '09. IEEE International
Conference_Location
S. Lake Tahoe, CA
ISSN
1930-8841
Print_ISBN
978-1-4244-3921-8
Electronic_ISBN
1930-8841
Type
conf
DOI
10.1109/IRWS.2009.5383035
Filename
5383035
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