• DocumentCode
    3144106
  • Title

    What triggers NBTI? An “on the fly” electron spin resonance approach

  • Author

    Ryan, J.T. ; Lenahan, Patrick M. ; Grasser, Tibor ; Enichlmair, H.

  • Author_Institution
    Pennsylvania State Univ., University Park, PA, USA
  • fYear
    2009
  • fDate
    18-22 Oct. 2009
  • Firstpage
    42
  • Lastpage
    45
  • Abstract
    We have developed a means to perform "on the fly" electron spin resonance (ESR) measurements of NBTI defect generation. The approach permits ESR measurements to be performed during NBTI stress void of any recovery contamination. We demonstrate that elevated temperature (100°C) and modest negative polarity oxide electric field (<5MV/cm) generates ESR spectra of E\´ oxide defects. (These defects are holes trapped in oxygen vacancies.) When similar measurements are made at elevated temperature and no oxide bias, E\´ center spectra are not observed. When ESR measurements are made with identical negative oxide bias at room temperature, E\´ center spectra are not observed. Furthermore, we demonstrate that the NBTI induced E\´ center spectrum disappears, a recovery phenomena, when the NBTI stressing condition is removed. These observations indicate that NBTI is triggered by inversion layer hole capture at an E\´ precursor site (an oxygen vacancy) which then leads to the depassivation of nearby interface states (Pb centers).
  • Keywords
    crystal defects; paramagnetic resonance; semiconductor device measurement; semiconductor device reliability; CMOS technology; E center spectra; ESR measurements; NBTI defect generation; elevated temperature; inversion layer hole capture; negative bias temperature instability; negative polarity oxide electric field; on the fly electron spin resonance; oxygen vacancy; p-MOSFET; polarity oxide electric field; temperature 1000 °C; Contamination; Electric variables measurement; Interface states; Niobium compounds; Paramagnetic resonance; Performance evaluation; Pollution measurement; Stress measurement; Temperature; Titanium compounds;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Integrated Reliability Workshop Final Report, 2009. IRW '09. IEEE International
  • Conference_Location
    S. Lake Tahoe, CA
  • ISSN
    1930-8841
  • Print_ISBN
    978-1-4244-3921-8
  • Electronic_ISBN
    1930-8841
  • Type

    conf

  • DOI
    10.1109/IRWS.2009.5383035
  • Filename
    5383035