• DocumentCode
    3144257
  • Title

    Reliability aspects of thermally stable LaB/sub 6/-Au Schottky contacts to GaAs

  • Author

    Würfl, J. ; Singh, J.K. ; Hartnagel, H.L.

  • Author_Institution
    Inst. fuer Hochfrequenztech, Tech. Hochscule Darmstadt, West Germany
  • fYear
    1990
  • fDate
    27-29 March 1990
  • Firstpage
    87
  • Lastpage
    93
  • Abstract
    A systematic investigation of the reliability and the possible degradation mechanisms of Au-LaB/sub 6/ Schottky contacts to GaAs is presented. Due to a relatively large barrier height ( approximately=0.9 eV) LaB/sub 6/ Schottky contacts are particularly interesting for low leakage current device operation, even at elevated temperatures. The high thermal stability enables sophisticated fabrication processes in connection with ion implantation. The dependence of the contact reliability on certain annealing and processing techniques during device fabrication is demonstrated. Accelerated lifetime tests, in combination with electrical measurements and X-ray photoelectron spectroscopy (XPS) sputter profiling, have been performed, indicating that optimized technological parameters yield reliable contacts with good electrical characteristics.<>
  • Keywords
    III-V semiconductors; Schottky effect; Schottky gate field effect transistors; X-ray photoelectron spectra; annealing; gallium arsenide; gold; lanthanum compounds; leakage currents; life testing; metallisation; reliability; Au-LaB/sub 6/-GaAs; MESFET; Schottky contacts; X-ray photoelectron spectroscopy; XPS sputter profiling; annealing; barrier height; contact reliability; degradation mechanisms; device fabrication; electrical characteristics; electrical measurements; elevated temperatures; high thermal stability; ion implantation; low leakage current device operation; processing; sophisticated fabrication processes; systematic investigation; Annealing; Contacts; Fabrication; Gallium arsenide; Ion implantation; Leakage current; Schottky barriers; Temperature; Thermal degradation; Thermal stability;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium, 1990. 28th Annual Proceedings., International
  • Conference_Location
    New Orleans, LA, USA
  • Type

    conf

  • DOI
    10.1109/RELPHY.1990.66067
  • Filename
    66067