DocumentCode
3144257
Title
Reliability aspects of thermally stable LaB/sub 6/-Au Schottky contacts to GaAs
Author
Würfl, J. ; Singh, J.K. ; Hartnagel, H.L.
Author_Institution
Inst. fuer Hochfrequenztech, Tech. Hochscule Darmstadt, West Germany
fYear
1990
fDate
27-29 March 1990
Firstpage
87
Lastpage
93
Abstract
A systematic investigation of the reliability and the possible degradation mechanisms of Au-LaB/sub 6/ Schottky contacts to GaAs is presented. Due to a relatively large barrier height ( approximately=0.9 eV) LaB/sub 6/ Schottky contacts are particularly interesting for low leakage current device operation, even at elevated temperatures. The high thermal stability enables sophisticated fabrication processes in connection with ion implantation. The dependence of the contact reliability on certain annealing and processing techniques during device fabrication is demonstrated. Accelerated lifetime tests, in combination with electrical measurements and X-ray photoelectron spectroscopy (XPS) sputter profiling, have been performed, indicating that optimized technological parameters yield reliable contacts with good electrical characteristics.<>
Keywords
III-V semiconductors; Schottky effect; Schottky gate field effect transistors; X-ray photoelectron spectra; annealing; gallium arsenide; gold; lanthanum compounds; leakage currents; life testing; metallisation; reliability; Au-LaB/sub 6/-GaAs; MESFET; Schottky contacts; X-ray photoelectron spectroscopy; XPS sputter profiling; annealing; barrier height; contact reliability; degradation mechanisms; device fabrication; electrical characteristics; electrical measurements; elevated temperatures; high thermal stability; ion implantation; low leakage current device operation; processing; sophisticated fabrication processes; systematic investigation; Annealing; Contacts; Fabrication; Gallium arsenide; Ion implantation; Leakage current; Schottky barriers; Temperature; Thermal degradation; Thermal stability;
fLanguage
English
Publisher
ieee
Conference_Titel
Reliability Physics Symposium, 1990. 28th Annual Proceedings., International
Conference_Location
New Orleans, LA, USA
Type
conf
DOI
10.1109/RELPHY.1990.66067
Filename
66067
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