• DocumentCode
    3146726
  • Title

    Microscopic and statistical approach to SILC characteristics-exponential relation between distributed Fowler Nordheim coefficients and its physical interpretation

  • Author

    Tsuji, N. ; Sakakibara, K. ; Ajika, N. ; Miyoshi, H.

  • Author_Institution
    ULSI Lab., Mitsubishi Electr. Corp., Hyogo, Japan
  • fYear
    1998
  • fDate
    9-11 June 1998
  • Firstpage
    196
  • Lastpage
    197
  • Abstract
    Microscopic characteristics of stress-induced leakage current (mSILC) are studied by analyzing a large amount of data on the charge retention characteristic of stacked gate arrayed transistors. It is found that the SILC characteristics fluctuate in the microscopic regions, but they all fit the Fowler Nordheim (F-N) formula. Moreover, the coefficients /spl alpha/ and /spl beta/ of the F-N equation, which are conventionally constants, are obtained in this study by statistically analyzing mSILC characteristics, and are therefore distributed, with a strong exponential relation to each other. It is found that this correlation can be qualitatively explained by the analytical trap-trap transition model.
  • Keywords
    MOSFET; electron traps; leakage currents; semiconductor device models; SILC characteristics; analytical trap-trap transition model; charge retention characteristic; distributed Fowler Nordheim coefficients; exponential relation; stacked gate arrayed transistors; stress-induced leakage current; Analytical models; Capacitors; Electron traps; Equations; Laboratories; Leakage current; Microscopy; Stress; Tunneling; Ultra large scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Technology, 1998. Digest of Technical Papers. 1998 Symposium on
  • Conference_Location
    Honolulu, HI, USA
  • Print_ISBN
    0-7803-4770-6
  • Type

    conf

  • DOI
    10.1109/VLSIT.1998.689254
  • Filename
    689254