DocumentCode
3146726
Title
Microscopic and statistical approach to SILC characteristics-exponential relation between distributed Fowler Nordheim coefficients and its physical interpretation
Author
Tsuji, N. ; Sakakibara, K. ; Ajika, N. ; Miyoshi, H.
Author_Institution
ULSI Lab., Mitsubishi Electr. Corp., Hyogo, Japan
fYear
1998
fDate
9-11 June 1998
Firstpage
196
Lastpage
197
Abstract
Microscopic characteristics of stress-induced leakage current (mSILC) are studied by analyzing a large amount of data on the charge retention characteristic of stacked gate arrayed transistors. It is found that the SILC characteristics fluctuate in the microscopic regions, but they all fit the Fowler Nordheim (F-N) formula. Moreover, the coefficients /spl alpha/ and /spl beta/ of the F-N equation, which are conventionally constants, are obtained in this study by statistically analyzing mSILC characteristics, and are therefore distributed, with a strong exponential relation to each other. It is found that this correlation can be qualitatively explained by the analytical trap-trap transition model.
Keywords
MOSFET; electron traps; leakage currents; semiconductor device models; SILC characteristics; analytical trap-trap transition model; charge retention characteristic; distributed Fowler Nordheim coefficients; exponential relation; stacked gate arrayed transistors; stress-induced leakage current; Analytical models; Capacitors; Electron traps; Equations; Laboratories; Leakage current; Microscopy; Stress; Tunneling; Ultra large scale integration;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Technology, 1998. Digest of Technical Papers. 1998 Symposium on
Conference_Location
Honolulu, HI, USA
Print_ISBN
0-7803-4770-6
Type
conf
DOI
10.1109/VLSIT.1998.689254
Filename
689254
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