Title :
Nano-gap fabrication by focused ion beam for DNA trapping
Author :
Kumemura, Momoko ; Tamura, Keiichi ; Hashiguchi, Gen ; Collard, Doifique ; Fujita, Hiroyuki
Author_Institution :
Inst. of Ind. Sci., Tokyo Univ.
Abstract :
Micromachined tweezers is having nanometer sized gap was fabricated with a silicon etching method and a focussed ion beam technique. The gap of tweezer fabricated by this process was accomplished to be 15 nm-2 mum ranges. The validity of this tweezers was demonstrated by trapping DNA molecules. Trapping of bundle of lambda-DNA molecules between 100 mum gap was succeeded
Keywords :
DNA; biological techniques; focused ion beam technology; genetics; micromachining; molecular biophysics; nanotechnology; silicon; sputter etching; focused ion beam technique; lambda-DNA molecule trapping; micromachined tweezer; nanometer sized gap fabrication; silicon etching method; Conducting materials; DNA; Electron traps; Fabrication; Ion beams; Micromachining; Nanobioscience; Probes; Scanning electron microscopy; Silicon; Focusedion beam; Micromahineing; Molecular manipulation; Nano-gap; ¿-DNA;
Conference_Titel :
Microtechnologies in Medicine and Biology, 2006 International Conference on
Conference_Location :
Okinawa
Print_ISBN :
1-4244-0338-3
Electronic_ISBN :
1-4244-0338-3
DOI :
10.1109/MMB.2006.251547
