• DocumentCode
    3147392
  • Title

    High piezoelectric activity in nonpoled thin films prepared by vapor deposition polymerization

  • Author

    Kubono, Atsushi ; Murai, Masashi ; Tasaka, Shigeru

  • Author_Institution
    Dept. Mater. Sci. & Eng., Shizuoka Univ., Hamamatsu
  • fYear
    2008
  • fDate
    15-17 Sept. 2008
  • Abstract
    A simple dry process in vacuum was developed for the preparation of polyamide, polyimide, and polyurea thin films on the basis of the conventional vapor deposition technique; this method was termed vapor deposition polymerization (VDP). Pyroelectric and piezoelectric properties have been observed for the polyurea thin films prepared by the VDP method with a poling treatment. Instead of the above conventional poling method, we have proposed a new method, "surface energy poling". A polar structure can be constructed spontaneously in a thin film when a polar polymer is sandwiched between two materials with higher and lower surface energies. In this paper, we discuss piezoelectric behavior in nonpoled thin films of aromatic polyurea prepared by the VDP method, i.e., synthesized by simultaneous deposition of a diamine monomer and a diisocyanate monomer in vacuum without a conventional poling process.
  • Keywords
    infrared spectra; piezoelectricity; polymer films; polymerisation; pyroelectricity; surface energy; vacuum deposition; diamine monomer; diisocyanate monomer; dry process; nonpoled thin films; piezoelectric activity; piezoelectric properties; polar polymer; polar structure; poling treatment; polyamide thin film; polyimide thin film; polyurea thin film; pyroelectric properties; surface energy poling; vacuum deposition; vapor deposition polymerization; Chemical vapor deposition; Glass; Piezoelectric films; Polyimides; Polymer films; Pyroelectricity; Sputtering; Substrates; Surface treatment; Temperature dependence;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electrets, 2008. ISE-13. 13th International Symposium on
  • Conference_Location
    Tokyo
  • Print_ISBN
    978-1-4244-1850-3
  • Electronic_ISBN
    978-1-4244-1851-0
  • Type

    conf

  • DOI
    10.1109/ISE.2008.4814049
  • Filename
    4814049