Production of ultra-short, high charge, low emittance electron bunches using a 1 GV/m DC gun

Author

de Loos, M.J. ; van der Geer, S.B. ; Botman, J.I.M. ; Luiten, O.J. ; van der Wiel, M.J.

Author_Institution

Pulsar Phys., Netherlands

Volume

5

fYear

1999

fDate

1999

Firstpage

3266

Abstract

Advanced acceleration schemes, for example those based on wake fields of laser pulses traveling through plasma, require the injection of very high quality relativistic femtosecond electron bunches. Such bunches can be produced by a photoexcited RF gun followed by longitudinal bunch compression. Currently we are investigating a different pre-acceleration scheme, which avoids the necessity of magnetic compression and the associated potential emittance growth due to coherent synchrotron radiation

Keywords

accelerator RF systems; accelerator cavities; collective accelerators; electron accelerators; electron guns; electron sources; particle beam bunching; relativistic electron beams; wakefield accelerators; 2 MV; 2 MeV; DC gun; advanced acceleration schemes; coherent synchrotron radiation; high charge electron bunches; laser pulses; longitudinal bunch compression; low emittance electron bunches; magnetic compression; photoexcited RF gun; plasma; potential emittance growth; preacceleration scheme; relativistic femtosecond electron bunches; ultrashort electron bunches; wake fields; Cathodes; Electron emission; Network address translation; Physics; Plasma accelerators; Power supplies; Production; Pulsed power supplies; Radio frequency; Synchrotron radiation;

fLanguage

English

Publisher

ieee

Conference_Titel

Particle Accelerator Conference, 1999. Proceedings of the 1999

Conference_Location

New York, NY

Print_ISBN

0-7803-5573-3

Type

conf

DOI

10.1109/PAC.1999.792271

Filename

792271