Title :
Breakthroughs in Photonics 2013: Organic Nanostructures for Antireflection
Author :
Schulz, U. ; Munzert, P. ; Rickelt, F. ; Kaiser, N.
Author_Institution :
Fraunhofer Inst. for Appl. Opt. & Precision Eng., Jena, Germany
Abstract :
The processing of organic substances by vacuum deposition is opening new possibilities for the properties of optical surfaces. Organic small molecules can be evaporated and deposited like optical thin films. Plasma etching, which has been successfully applied to generate nanostructures on polymer substrates, is now used for obtaining antireflective nanostructures on top of interference stacks on glass. The latest results in achieving excellent antireflective properties for a wide range of light incidence angles were accomplished through multiple etching of polymer substrates and organic layers.
Keywords :
antireflection coatings; nanofabrication; nanostructured materials; polymer films; sputter etching; vacuum deposition; SiO2; antireflective nanostructures; evaporation; glass surface; interference stacks; light incidence angles; optical surfaces; optical thin films; organic layers; organic nanostructures; organic small molecules; organic substances; plasma etching; polymer substrates; vacuum deposition; Coatings; Etching; Nanostructures; Plasmas; Polymers; Substrates; Thin film coatings; subwavelength structures; synthesis and fabrication methods;
Journal_Title :
Photonics Journal, IEEE
DOI :
10.1109/JPHOT.2014.2311432
