• DocumentCode
    3150204
  • Title

    Estimation of near-E field and far-field radiation pattern with only near-H field measurement by using the Yee scheme

  • Author

    Hirayama, Hiroshi ; Kami, Yoshio

  • Author_Institution
    Univ. of Electro-Commun., Tokyo
  • Volume
    1
  • fYear
    2003
  • fDate
    16-16 May 2003
  • Firstpage
    84
  • Abstract
    Near-field measurement is done for the purpose of decreasing far-field emission from electric equipment. Measured fields are plotted, and then a region where the field intensity is strong is regarded to be taken a step. However, in current manufacturing facilities, plotting alone is insufficient to reduce the present emissions. In this paper, we propose a new method using the Yee scheme for near-field measurement. This method enables us to: 1) obtain the E-field distribution through only the H-field measurement; and 2) estimate the far-field radiation pattern by using only the measured H-field distribution. Our experiments confirmed the effectiveness of the method
  • Keywords
    electromagnetic compatibility; electromagnetic wave propagation; field strength measurement; E-field distribution; Yee scheme; electric equipment; far-field emission; far-field radiation pattern estimation; field intensity; manufacturing facilities; near-E field radiation pattern estimation; near-H field measurement; near-field measurement; Data mining; Electric variables measurement; Electromagnetic fields; Electromagnetic measurements; Magnetic field measurement; Magnetic shielding; Manufacturing; Maxwell equations; Measurement errors; Production facilities;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electromagnetic Compatibility, 2003. EMC '03. 2003 IEEE International Symposium on
  • Conference_Location
    Istanbul
  • Print_ISBN
    0-7803-7779-6
  • Type

    conf

  • DOI
    10.1109/ICSMC2.2003.1428199
  • Filename
    1428199