DocumentCode
3150204
Title
Estimation of near-E field and far-field radiation pattern with only near-H field measurement by using the Yee scheme
Author
Hirayama, Hiroshi ; Kami, Yoshio
Author_Institution
Univ. of Electro-Commun., Tokyo
Volume
1
fYear
2003
fDate
16-16 May 2003
Firstpage
84
Abstract
Near-field measurement is done for the purpose of decreasing far-field emission from electric equipment. Measured fields are plotted, and then a region where the field intensity is strong is regarded to be taken a step. However, in current manufacturing facilities, plotting alone is insufficient to reduce the present emissions. In this paper, we propose a new method using the Yee scheme for near-field measurement. This method enables us to: 1) obtain the E-field distribution through only the H-field measurement; and 2) estimate the far-field radiation pattern by using only the measured H-field distribution. Our experiments confirmed the effectiveness of the method
Keywords
electromagnetic compatibility; electromagnetic wave propagation; field strength measurement; E-field distribution; Yee scheme; electric equipment; far-field emission; far-field radiation pattern estimation; field intensity; manufacturing facilities; near-E field radiation pattern estimation; near-H field measurement; near-field measurement; Data mining; Electric variables measurement; Electromagnetic fields; Electromagnetic measurements; Magnetic field measurement; Magnetic shielding; Manufacturing; Maxwell equations; Measurement errors; Production facilities;
fLanguage
English
Publisher
ieee
Conference_Titel
Electromagnetic Compatibility, 2003. EMC '03. 2003 IEEE International Symposium on
Conference_Location
Istanbul
Print_ISBN
0-7803-7779-6
Type
conf
DOI
10.1109/ICSMC2.2003.1428199
Filename
1428199
Link To Document