• DocumentCode
    31517
  • Title

    High ON/OFF Ratio and Quantized Conductance in Resistive Switching of {\\rm TiO}_{2} on Silicon

  • Author

    Chengqing Hu ; McDaniel, Martin D. ; Ekerdt, John G. ; Yu, E.T.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Univ. of Texas at Austin, Austin, TX, USA
  • Volume
    34
  • Issue
    11
  • fYear
    2013
  • fDate
    Nov. 2013
  • Firstpage
    1385
  • Lastpage
    1387
  • Abstract
    TiO2 has been investigated extensively as an active resistive switching (RS) material for resistive random access memory. In this letter, single-crystal anatase- TiO2 thin films fabricated on silicon by atomic layer deposition are used to realize highly stable and clean bipolar RS behavior with a record high ON/OFF ratio (~107) and low leakage current in the high-resistance state. The switching characteristics resemble those of electrochemical memories via formation and dissolution of conductive filaments (CFs) composed of oxygen vacancies, and small numbers of quantized channels are reproducibly observed in the low-resistance state, consistent with quantized conductance (QC) found in conventional electrolytic systems and indicating its potential for forming ultrathin CF amenable to device scaling. A detailed analysis of QC and contact resistance is presented. The emergence of QC is believed to be related to the single-crystal nature of the TiO2 thin films.
  • Keywords
    atomic layer deposition; electrical conductivity; leakage currents; random-access storage; semiconductor thin films; titanium compounds; Si; TiO2; atomic layer deposition; bipolar resistive switching behavior; conductive filaments; contact resistance; leakage current; on/off ratio; oxygen vacancies; quantized conductance; resistive random access memory; resistive switching; single-crystal anatase-TiO2 thin films; switching characteristics; Atomic layer deposition; Epitaxial growth; Metals; Silicon; Switches; Threshold voltage; Conductive filament (CF); metal oxide; nonvolatile memory; quantized conductance (QC); resistive random access memory (RRAM); resistive switching (RS); titanium dioxide;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2013.2282154
  • Filename
    6615931