DocumentCode
3152311
Title
Technology Tracking for VLSI Layout Design Tools
Author
Chu, Kung-Chao ; Lien, Y. Edmund
Author_Institution
Microelectronics and Computer Technology Corporation (MCC), Austin, TX
fYear
1985
fDate
23-26 June 1985
Firstpage
279
Lastpage
285
Abstract
We describe a comprehensive way to organize information about VLSI technologies. This information is represented both in a syntactical structure and in a database format. The objective of the technology database is to exercise centralized control over all tools that use technology information so that the tools can be made immune to changes in technology to the extent possible. The syntactical representation allows for interchange among different companies, similar to what Electronic Design Interchange Format (EDIF) is designed for. The paper concentrates on technology tracking for layout tools. These tools include layout editing, compaction, routing, design-rule checking, extraction, plotting, and mask generation. Our scheme enables the same set of layout tools to work with different technologies (such as MOS and bipolar). The principle can be used for other VLSI design tools. We have also developed several tools specifically for handling technology databases.
Keywords
Centralized control; Chaos; Circuit simulation; Compaction; Databases; Design automation; Geometry; Paper technology; Switches; Very large scale integration;
fLanguage
English
Publisher
ieee
Conference_Titel
Design Automation, 1985. 22nd Conference on
ISSN
0738-100X
Print_ISBN
0-8186-0635-5
Type
conf
DOI
10.1109/DAC.1985.1585953
Filename
1585953
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