DocumentCode :
3152311
Title :
Technology Tracking for VLSI Layout Design Tools
Author :
Chu, Kung-Chao ; Lien, Y. Edmund
Author_Institution :
Microelectronics and Computer Technology Corporation (MCC), Austin, TX
fYear :
1985
fDate :
23-26 June 1985
Firstpage :
279
Lastpage :
285
Abstract :
We describe a comprehensive way to organize information about VLSI technologies. This information is represented both in a syntactical structure and in a database format. The objective of the technology database is to exercise centralized control over all tools that use technology information so that the tools can be made immune to changes in technology to the extent possible. The syntactical representation allows for interchange among different companies, similar to what Electronic Design Interchange Format (EDIF) is designed for. The paper concentrates on technology tracking for layout tools. These tools include layout editing, compaction, routing, design-rule checking, extraction, plotting, and mask generation. Our scheme enables the same set of layout tools to work with different technologies (such as MOS and bipolar). The principle can be used for other VLSI design tools. We have also developed several tools specifically for handling technology databases.
Keywords :
Centralized control; Chaos; Circuit simulation; Compaction; Databases; Design automation; Geometry; Paper technology; Switches; Very large scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Design Automation, 1985. 22nd Conference on
ISSN :
0738-100X
Print_ISBN :
0-8186-0635-5
Type :
conf
DOI :
10.1109/DAC.1985.1585953
Filename :
1585953
Link To Document :
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