• DocumentCode
    3152311
  • Title

    Technology Tracking for VLSI Layout Design Tools

  • Author

    Chu, Kung-Chao ; Lien, Y. Edmund

  • Author_Institution
    Microelectronics and Computer Technology Corporation (MCC), Austin, TX
  • fYear
    1985
  • fDate
    23-26 June 1985
  • Firstpage
    279
  • Lastpage
    285
  • Abstract
    We describe a comprehensive way to organize information about VLSI technologies. This information is represented both in a syntactical structure and in a database format. The objective of the technology database is to exercise centralized control over all tools that use technology information so that the tools can be made immune to changes in technology to the extent possible. The syntactical representation allows for interchange among different companies, similar to what Electronic Design Interchange Format (EDIF) is designed for. The paper concentrates on technology tracking for layout tools. These tools include layout editing, compaction, routing, design-rule checking, extraction, plotting, and mask generation. Our scheme enables the same set of layout tools to work with different technologies (such as MOS and bipolar). The principle can be used for other VLSI design tools. We have also developed several tools specifically for handling technology databases.
  • Keywords
    Centralized control; Chaos; Circuit simulation; Compaction; Databases; Design automation; Geometry; Paper technology; Switches; Very large scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Design Automation, 1985. 22nd Conference on
  • ISSN
    0738-100X
  • Print_ISBN
    0-8186-0635-5
  • Type

    conf

  • DOI
    10.1109/DAC.1985.1585953
  • Filename
    1585953