Title :
Nanomechanical test structure for optimal alignment in stencil-based lithography
Author :
Sansa, Marc ; Arcamone, Julien ; Verd, Jaume ; Uranga, Arantxa ; Abada, Gabriel ; Lora-Tamayo, Emilio ; Barniol, Nuria ; Van den Boogaart, Marc A F ; Savu, Veronica ; Brugger, Juergen ; Perez-Murano, Francesc
Author_Institution :
Inst. de Microelectron. de Barcelona CNM-IMB (CSIC), Barcelona
fDate :
March 30 2009-April 2 2009
Abstract :
A nanoelectromechanical mass sensor based on a submicron size resonating metallic beam is used to characterize material deposition rates in stencil lithography. The material flux through micron size apertures is mapped with high spatial (below 1 mum) and deposition rate (below 10 pm/s) resolutions by displacing stencil apertures above the sensor. It is discussed how the sensor can be used as a test alignment for multi-level nanostencil lithography.
Keywords :
beams (structures); micromechanical resonators; nanolithography; nanosensors; nanostructured materials; material deposition characterization; multilevel nanostencil lithography; nanoelectromechanical mass sensor; nanomechanical test structure; optimal alignment; stencil-based lithography; submicron size resonating metallic beam; Apertures; Circuit testing; Lithography; Mechanical sensors; Nanostructures; Resonance; Sensor phenomena and characterization; Spatial resolution; Stereolithography; System testing;
Conference_Titel :
Microelectronic Test Structures, 2009. ICMTS 2009. IEEE International Conference on
Conference_Location :
Oxnard, CA
Print_ISBN :
978-1-4244-4259-1
DOI :
10.1109/ICMTS.2009.4814631
