DocumentCode :
3153353
Title :
Benefit of Direct Charge Measurement (DCM) on Interconnect Capacitance Measurement
Author :
Miyake, Yasuhiro ; Goto, Masaharu
Author_Institution :
Agilent Technol. Int. Japan Ltd., Hachioji
fYear :
2009
fDate :
March 30 2009-April 2 2009
Firstpage :
211
Lastpage :
215
Abstract :
This paper discusses application of direct charge measurement (DCM) on characterizing on-chip interconnect capacitance. Measurement equipment and techniques are leveraged from Flat Panel Display testing. On-chip active device is not an essential necessity for DCM test structure and it is easy to implement parallel measurements. Femto-Farad measurement sensitivity is achieved without having on-chip active device. Measurement results of silicon and glass substrates, including parallel measurements, are presented.
Keywords :
capacitance measurement; charge measurement; integrated circuit interconnections; direct charge measurement; femtoFarad measurement sensitivity; flat panel display testing; glass substrates; interconnect capacitance measurement; on-chip active device; on-chip interconnect capacitance; silicon substrates; Capacitance measurement; Capacitors; Charge measurement; Chromium; Current measurement; Integrated circuit interconnections; Integrated circuit measurements; Leakage current; Switches; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microelectronic Test Structures, 2009. ICMTS 2009. IEEE International Conference on
Conference_Location :
Oxnard, CA
Print_ISBN :
978-1-4244-4259-1
Type :
conf
DOI :
10.1109/ICMTS.2009.4814644
Filename :
4814644
Link To Document :
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