Comparison of surface temperature readings between an embedded thermocouple in a silicon wafer and a hybrid-type temperature sensor

We compared the surface temperature readings of silicon wafers between the embedded thermocouple and the hybrid-type surface sensor which the authors developed. Uncertainties of both sensors are roughly 1 K in the temperature range between 600 and 1000 K. But, the hybrid-type surface sensor has an overwhelmed advantage that can continuously be carried out without leaving the atmosphere in a process. Therefore, the sensor has potential for in situ calibrations of temperature measurements in silicon manufacturing processes. In this paper, the environment and experimental setup for the comparison of temperature readings linked to the temperature standards and the uncertainties of both methods are described in detail.