DocumentCode
315647
Title
Device and technology optimizations for low power design in deep sub-micron regime
Author
Chen, Kai ; Hu, Chenming
Author_Institution
Dept. of Electr. Eng. & Comput. Sci., California Univ., Berkeley, CA, USA
fYear
1997
fDate
18-20 Aug. 1997
Firstpage
312
Lastpage
316
Abstract
This report, based on the most recent analytical and experimental studies of CMOS scaling and gate delay models, reexamines the fundamental design quantities such as driving current, I/sub dsat/, propagation delay, t/sub pd/, and switching energy, E, and investigates device optimization issues in deep sub-micron regime. Empirical I/sub dsat/ equations and device optimization guidelines with gate oxide, channel length and power supply scaling as well as interconnect loading are extracted.
Keywords
MOSFET; semiconductor device models; MOSFET model; channel length; deep sub-micron CMOS device scaling; driving current; gate delay; gate oxide; interconnect loading; low power design; optimization; power supply; propagation delay; switching energy; Analytical models; Degradation; Design optimization; MOSFET circuits; Permission; Power supplies; Predictive models; Propagation delay; Semiconductor device modeling; Threshold voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Low Power Electronics and Design, 1997. Proceedings., 1997 International Symposium on
Conference_Location
Monterey, CA, USA
Print_ISBN
0-89791-903-3
Type
conf
Filename
621307
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