• DocumentCode
    315647
  • Title

    Device and technology optimizations for low power design in deep sub-micron regime

  • Author

    Chen, Kai ; Hu, Chenming

  • Author_Institution
    Dept. of Electr. Eng. & Comput. Sci., California Univ., Berkeley, CA, USA
  • fYear
    1997
  • fDate
    18-20 Aug. 1997
  • Firstpage
    312
  • Lastpage
    316
  • Abstract
    This report, based on the most recent analytical and experimental studies of CMOS scaling and gate delay models, reexamines the fundamental design quantities such as driving current, I/sub dsat/, propagation delay, t/sub pd/, and switching energy, E, and investigates device optimization issues in deep sub-micron regime. Empirical I/sub dsat/ equations and device optimization guidelines with gate oxide, channel length and power supply scaling as well as interconnect loading are extracted.
  • Keywords
    MOSFET; semiconductor device models; MOSFET model; channel length; deep sub-micron CMOS device scaling; driving current; gate delay; gate oxide; interconnect loading; low power design; optimization; power supply; propagation delay; switching energy; Analytical models; Degradation; Design optimization; MOSFET circuits; Permission; Power supplies; Predictive models; Propagation delay; Semiconductor device modeling; Threshold voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Low Power Electronics and Design, 1997. Proceedings., 1997 International Symposium on
  • Conference_Location
    Monterey, CA, USA
  • Print_ISBN
    0-89791-903-3
  • Type

    conf

  • Filename
    621307