DocumentCode
3158036
Title
Experimental investigation of a field effect back surface passivation of silicon solar cells
Author
Bai, Yibin ; Phillips, James E. ; Barnett, Allen M.
Author_Institution
Dept. of Electr. Eng., Delaware Univ., Newark, DE, USA
fYear
1996
fDate
13-17 May 1996
Firstpage
425
Lastpage
428
Abstract
An independent MOS structure is added to an operating silicon solar cell in order to gain insight into the effects of an electric field on the surface passivation of silicon solar cells. This solar cell structure allows the modulation of effective back surface recombination velocity (BSRV) and hence solar cell performance. All three bias regions of a MOS system (accumulation, depletion and inversion) are examined. The combined effects of carrier injection levels, oxide charges and gate bias voltage on the device operation and BSRV are experimentally investigated. The biasing conditions of the MOS system are found to be important to the solar cell performance. The methods of locating the optimum biasing condition of the MOS system are described
Keywords
MIS structures; elemental semiconductors; passivation; silicon; solar cells; surface recombination; Si; Si solar cells; accumulation region; back surface recombination velocity modulation; bias regions; carrier injection levels; depletion region; device operation; field effect back surface passivation; gate bias voltage; independent MOS structure; inversion region; optimum biasing condition location; oxide charges; silicon solar cells; solar cell performance; solar cell structure; Charge carrier processes; Electrodes; Energy conversion; Lighting; Oxidation; Passivation; Photovoltaic cells; Silicon; Spontaneous emission; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Specialists Conference, 1996., Conference Record of the Twenty Fifth IEEE
Conference_Location
Washington, DC
ISSN
0160-8371
Print_ISBN
0-7803-3166-4
Type
conf
DOI
10.1109/PVSC.1996.564034
Filename
564034
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