Title :
Failure analysis of a VLSI double metal microprocessor using advanced tools
Author_Institution :
Nat. Semicond., Migdal Ha´´emek, Israel
Abstract :
Finding what went wrong in a VLSI chip that failed is difficult due to the technology complexity. The search for the process step causing the failure is key in the analysis procedure. This paper describes the failure analysis of a high performance 32-bit microprocessor chip. In this failure analysis, advanced tools like e-beam and focused ion beam were used. These tools helped in the investigation leading to a full understanding of the failure mode
Keywords :
VLSI; failure analysis; metallisation; microprocessor chips; 32-bit microprocessor chip; VLSI double metal microprocessor; analysis procedure; electron beam testing; failure analysis; Automatic testing; Electron beams; Electronic equipment testing; Failure analysis; Ion beams; Microprocessors; Probes; Scanning electron microscopy; Transistors; Very large scale integration;
Conference_Titel :
Electrical and Electronics Engineers in Israel, 1991. Proceedings., 17th Convention of
Conference_Location :
Tel Aviv
Print_ISBN :
0-87942-678-0
DOI :
10.1109/EEIS.1991.217712
