• DocumentCode
    3160044
  • Title

    Hot-carrier reliability of bipolar transistors

  • Author

    Burnett, David ; Hu, Chenming

  • Author_Institution
    Dept. of Electr. Eng. & Comput. Sci., California Univ., Berkeley, CA, USA
  • fYear
    1990
  • fDate
    27-29 March 1990
  • Firstpage
    164
  • Lastpage
    169
  • Abstract
    A study of bipolar degradation over a range of stress and measurement conditions is presented. It is shown that the excess base current, Delta I/sub B/, varies in a power-law manner with J/sub C/, I/sub R/, and t. The I/sub R/ dependence results from a significant nonlocal effect in electron temperature that occurs at the periphery of the emitter due to the narrow depletion width. A quasistatic model of the degradation, suitable for SPICE circuit simulation, is presented and used to simulate the degradation of a BiCMOS inverter and differential pair circuit. The simulation of an advanced BiCMOS process indicates a degradation in the low-to-high propagation delay of 7% and 300 K and 3% at 110 K after 10 years of operation with C/sub L/=2 pf and V/sub CC/=5.5 V. For emitter-coupled pair circuits, the base current degradation can create a voltage drop across the base resistance, resulting in an additional offset voltage component. With the modeling methodology presented, one can predict the effect of varying the emitter-extrinsic-base junction doping profile on circuit reliability.<>
  • Keywords
    BIMOS integrated circuits; bipolar transistors; circuit analysis computing; hot carriers; reliability; semiconductor device models; 10 y; 110 K; 2 pF; 300 K; 5.5 V; BiCMOS inverter; SPICE circuit simulation; additional offset voltage component; advanced BiCMOS process; base current degradation; base resistance; bipolar degradation; bipolar transistors; circuit reliability; differential pair circuit; emitter-coupled pair circuits; emitter-extrinsic-base junction doping profile; excess base current; hot carrier reliability; low-to-high propagation delay; narrow depletion width; nonlocal effect in electron temperature; quasistatic model; reverse bias; reverse current; voltage drop; years of operation; BiCMOS integrated circuits; Bipolar transistors; Circuit simulation; Degradation; Electron emission; Hot carriers; SPICE; Stress measurement; Temperature dependence; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium, 1990. 28th Annual Proceedings., International
  • Conference_Location
    New Orleans, LA, USA
  • Type

    conf

  • DOI
    10.1109/RELPHY.1990.66081
  • Filename
    66081