Characterisation of TFMS and CPW Lines and Interconnections up to 100 GHz in Multilayer Photoimageable Thick Film Technology

This paper describes the characterisation of a photoimageable multilayer thick film process up to 100 GHz using a side-coupled TFMS linear microstrip resonator. The technique yields more consistent results than previous ring resonator work. The TFMS and CPW transmission lines and wideband layer to layer transition are also characterised up to 100 GHz for multilayer MCM application. Up to 80 GHz the TFMS and CPW lines exhibit low loss of <0.25dB/mm and the layer-to-layer transitions demonstrate extremely low loss of < 0.1dB. This performance is better than many reported results for thin film technology