DocumentCode
3161204
Title
Process Optimisation and Characterization of Excimer Laser Drilling of Microvias in Glass
Author
Bhatt, Deepa ; Williams, Karen ; Hutt, David A. ; Conway, Paul P.
Author_Institution
Loughborough Univ., Loughborough
fYear
2007
fDate
10-12 Dec. 2007
Firstpage
196
Lastpage
201
Abstract
Thin glass sheets may be a suitable material from which substrates for high density electrical interconnect can be produced. Since glass is extremely brittle, micromachining of thin glass substrates to create microvias and tracks is a significant challenge for which laser machining technologies offer a potential solution. This work aims to optimize and characterize the process of microvia drilling in 50-100 mum thick CMZ glass using a KrF excimer laser (wavelength = 248 nm: pulse length = 34 ns). The effect of various laser process parameters: pulse energy, pulse repetition rate and irradiation time on the geometry, debris and remelt formation of the microvias were studied. Through-hole drilling of 100 Dm diameter (entry hole) microvias was achieved successfully at a fluence (energy density) of 3 J/cm2 with repetition rates as low as 20 Hz within 20 s, giving a taper profile of 19-24deg. Microvia drilling was improved by adjusting the optical set-up to increase the fluence to 4.5 J/cm2 which reduced the taper angle to 14deg giving an exit hole diameter of around 50 mum. It was possible to achieve through hole microvias with smaller diameters down to 40 mum in 50 mum thick glass. Debris and remelt formation around microvias was a key issue which was minimized by using a protective layer coating on the glass. In addition to laser operating parameters, laser beam intensity distribution also strongly influenced the microvia drilling process.
Keywords
drilling; excimer lasers; glass; interconnections; laser beam machining; laser beams; excimer laser drilling; high density electrical interconnect; laser beam intensity distribution; laser machining technologies; laser process parameters; micromachining; microvia drilling; process optimisation; protective layer coating; size 40 mum; size 50 mum to 100 mum; thin glass sheets; time 20 s; wavelength 248 nm; Coatings; Drilling; Geometrical optics; Glass; Machining; Micromachining; Optical materials; Optical pulses; Protection; Sheet materials;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronics Packaging Technology Conference, 2007. EPTC 2007. 9th
Conference_Location
Singapore
Print_ISBN
978-1-4244-1323-2
Electronic_ISBN
978-1-4244-1323-2
Type
conf
DOI
10.1109/EPTC.2007.4469750
Filename
4469750
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