High aspect pattern fabrication by nano imprint lithography using fine diamond mold

Nano imprint lithography is an attractive fine lithographic method to obtain nano patterns by using low cost process and materials., Various applications have been demonstrated to utilize this fine method. One of the advantages of nano imprint lithography is that a wet development process is not required, which sometimes causes sticking errors by surface tension during wet development process. On the other hand, there is no fear of such defects by imprint lithography because a resist is mechanically deformed and released. We have demonstrated high aspect ratio pattern fabrication as high as 6.0 with 200nm in line width. But the mold is fabricated using thin Si substrate and anisotropic wet chemical etching, which cannot fabricate voluntary patterns by crystalline axis dependence.