• DocumentCode
    3163779
  • Title

    The motivation and challenges of direct writing on semiconductor wafers

  • Author

    Lin, B.J.

  • Author_Institution
    Taiwan Semicond. Manuf. Co. Inc., Hsin-Chu, Taiwan
  • fYear
    2002
  • fDate
    6-8 Nov. 2002
  • Firstpage
    28
  • Lastpage
    29
  • Abstract
    For decades, catadioptric optical lithography has continuously been incrementally extended to meet the need of the semiconductor industry. The three parameters to improve resolution, wavelength, numerical aperture (NA) and k/sub 1/ reduction, are reaching their limits. The author reviews the motivations and challenges to meet present and near future demands.
  • Keywords
    nanolithography; photolithography; catadioptric optical lithography; numerical aperture; resolution; wavelength; CMOS logic circuits; Cost function; Fixtures; Lithography; Optical imaging; Printing; Resists; Throughput; Ultraviolet sources; Writing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International
  • Conference_Location
    Tokyo, Japan
  • Print_ISBN
    4-89114-031-3
  • Type

    conf

  • DOI
    10.1109/IMNC.2002.1178527
  • Filename
    1178527
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3163779