DocumentCode
3164116
Title
Evaluation of finished EUVL masks using a Mirau interferometric microscope
Author
Kinoshita, H. ; Haga, T. ; Hamamoto, K. ; Takada, S. ; Kazui, N. ; Kakunai, S. ; Tsubakino, H. ; Watanabe, T.
Author_Institution
Himeji Inst. of Technol., Hyougo, Japan
fYear
2002
fDate
6-8 Nov. 2002
Firstpage
64
Lastpage
65
Abstract
We have developed an EUVL experimental exposure system and demonstrated fine pattern replication less than 60 nm. Using this system, we have evaluated the characteristics of chemical amplitude resists. Also a series of studies for evaluating different type of masks has been carried out to establish mask process, e.g. selection of absorber or buffer material, etching conditions and so on.
Keywords
etching; light interferometry; masks; nanolithography; optical microscopy; photoresists; ultraviolet lithography; EUVL experimental exposure system; Mirau interferometric microscope; absorber; buffer material; chemical amplitude resists; etching conditions; fine pattern replication; finished EUVL masks; mask process; masks; Scanning electron microscopy;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International
Conference_Location
Tokyo, Japan
Print_ISBN
4-89114-031-3
Type
conf
DOI
10.1109/IMNC.2002.1178545
Filename
1178545
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