Fabrication of nano/microstructures in SiO/sub 2/ and TiO/sub 2/ by swift ions

Author

Awazu, K. ; Fujimaki, M. ; Ishii, S. ; Shima, K. ; Nomura, K. ; Ohki, Y.

fYear

2002

fDate

6-8 Nov. 2002

Firstpage

68

Lastpage

69

Abstract

The authors introduce work on 2D and 3D nano/microfabrication with MeV ion beam irradiation on a-SiO/sub 2/ and rutile single crystal TiO/sub 2/. The electronic stopping of the ions is responsible for the track formation. The latent tracks atomic structure and enhanced etch rate are identified.

Keywords

energy loss of particles; ion beam effects; nanotechnology; semiconductor materials; silicon compounds; sputter etching; titanium compounds; 2D nano/microfabrication; 3D nano/microfabrication; SiO/sub 2/; TiO/sub 2/; a-SiO/sub 2/; electronic ion stopping; enhanced etch rate; fictive temperature; latent tracks; microfabrication; nanofabrication; planar four-member rings; planar three-member rings; rutile single crystal; swift heavy ions irradiation; thermal spike model; track formation; Amorphous materials; Arrayed waveguide gratings; Chemicals; Etching; Fabrication; Heating; Photonic crystals; Temperature; Thermal quenching;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International

Conference_Location

Tokyo, Japan

Print_ISBN

4-89114-031-3

Type

conf

DOI

10.1109/IMNC.2002.1178547

Filename

1178547