DocumentCode
3164477
Title
Study on the optimization of high transmittance attenuated phase-shifting mask by design of experiment
Author
Wen-an Leong ; Hsien-yun Lin ; Wen-long Yeh
Author_Institution
Inst. of Appl. Chem., Nat. Chiao Tung Univ., Hsinchu, Taiwan
fYear
2002
fDate
6-8 Nov. 2002
Firstpage
106
Abstract
Without changing exposure source, the size of device can be reduced by resolution enhancement techniques (RETs). The application of design of experiment (DOE) can increase the process latitude by optimizing parameters and process settings with no extra cost. The using of optical proximity correction (OPC) can correct the pattern distortion of resist effectively.
Keywords
design of experiments; light transmission; optimisation; phase shifting masks; photoresists; proximity effect (lithography); design of experiment; exposure source; high transmittance attenuated phase-shifting mask; optical proximity correction; optimization; pattern distortion; process latitude; process settings; resist; resolution enhancement techniques; Apertures; Design optimization; Fabrication; Optical arrays; Optical attenuators; Optical distortion; Optical scattering; Resists; Temperature; US Department of Energy;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International
Conference_Location
Tokyo, Japan
Print_ISBN
4-89114-031-3
Type
conf
DOI
10.1109/IMNC.2002.1178566
Filename
1178566
Link To Document