The novel nano-fabrication technique with low edge roughness

This paper demonstrates the novel nano-fabrication technique usable in the mass-production with low cost and high through-put.. The F/sub 2/ stepper and the electron beam stepper are expected as future technologies for sub-0.1/spl mu/m node. However, such a stepper costs as much as about $ 20,000,000. Nano-scale devices such as a single electron transistor are sometimes fabricated by using a tip of an atomic force microscope (AFM). However, it does not appear as an industrially acceptable technique. Hence, if a novel method utilizing only conventional photolithographic technique is developed for nano-size fabrication, it surely opens the new stages. For its purpose, we have developed a new method, in which a contact patternmask with nanometer-size slits (nanometer slit mask) is fabricated by combining the conventional photolithography and anodic oxidation.