DocumentCode
3165080
Title
Fabrication of nano-gap electrodes using ultrathin metal film
Author
Miyazaki, T. ; Kobayashi, K. ; Ishida, K. ; Horiuchi, T. ; Yamada, H. ; Matsushige, K.
Author_Institution
Dept. of Electron. Sci. & Eng., Kyoto Univ., Japan
fYear
2002
fDate
6-8 Nov. 2002
Firstpage
154
Lastpage
155
Abstract
Organic molecules have attracted a great deal of attention because of their promising applications to electronics. Many researchers have recently studied electrical properties of ultrathin molecular films for the developments of molecular electronic devices (MEDs). Since electrical junctions between the metallic electrode and the molecular film are directly related to the carrier injection in the device, the nanoscale investigations of molecular structures and electrical properties at the metal/molecular film interface is indispensable. Scanning probe microscopy techniques are remarkably suitable methods for such investigations. However, it is often difficult to bring the probe tip in the close proximity of the electrode edge because of a large difference in height between the electrode and the ultrathin molecular film with the typical thickness of a few nm, which prevents us from the nanoscale investigations of the metal/molecular-film interface. In this study, for overcoming the difficulty we fabricated Pt nano-gap electrodes having a molecular-scale thickness and atomical flatness. We investigated the structures and the electrical properties of the molecular films at the electrode edge using atomic force microscopy (AFM) and Kelvin force microscopy.
Keywords
atomic force microscopy; electrodes; molecular electronics; nanocontacts; nanolithography; platinum; Kelvin force microscopy; Pt; Pt nano-gap electrodes; atomic force microscopy; atomical flatness; molecular electronic devices; molecular-scale thickness; nano-gap electrodes fabrication; scanning probe microscopy techniques; ultrathin metal film; Atomic force microscopy; Atomic layer deposition; Electrodes; Fabrication; Nanostructures; Probes; Semiconductor films; Substrates; Surfaces; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International
Conference_Location
Tokyo, Japan
Print_ISBN
4-89114-031-3
Type
conf
DOI
10.1109/IMNC.2002.1178590
Filename
1178590
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