• DocumentCode
    3165080
  • Title

    Fabrication of nano-gap electrodes using ultrathin metal film

  • Author

    Miyazaki, T. ; Kobayashi, K. ; Ishida, K. ; Horiuchi, T. ; Yamada, H. ; Matsushige, K.

  • Author_Institution
    Dept. of Electron. Sci. & Eng., Kyoto Univ., Japan
  • fYear
    2002
  • fDate
    6-8 Nov. 2002
  • Firstpage
    154
  • Lastpage
    155
  • Abstract
    Organic molecules have attracted a great deal of attention because of their promising applications to electronics. Many researchers have recently studied electrical properties of ultrathin molecular films for the developments of molecular electronic devices (MEDs). Since electrical junctions between the metallic electrode and the molecular film are directly related to the carrier injection in the device, the nanoscale investigations of molecular structures and electrical properties at the metal/molecular film interface is indispensable. Scanning probe microscopy techniques are remarkably suitable methods for such investigations. However, it is often difficult to bring the probe tip in the close proximity of the electrode edge because of a large difference in height between the electrode and the ultrathin molecular film with the typical thickness of a few nm, which prevents us from the nanoscale investigations of the metal/molecular-film interface. In this study, for overcoming the difficulty we fabricated Pt nano-gap electrodes having a molecular-scale thickness and atomical flatness. We investigated the structures and the electrical properties of the molecular films at the electrode edge using atomic force microscopy (AFM) and Kelvin force microscopy.
  • Keywords
    atomic force microscopy; electrodes; molecular electronics; nanocontacts; nanolithography; platinum; Kelvin force microscopy; Pt; Pt nano-gap electrodes; atomic force microscopy; atomical flatness; molecular electronic devices; molecular-scale thickness; nano-gap electrodes fabrication; scanning probe microscopy techniques; ultrathin metal film; Atomic force microscopy; Atomic layer deposition; Electrodes; Fabrication; Nanostructures; Probes; Semiconductor films; Substrates; Surfaces; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International
  • Conference_Location
    Tokyo, Japan
  • Print_ISBN
    4-89114-031-3
  • Type

    conf

  • DOI
    10.1109/IMNC.2002.1178590
  • Filename
    1178590