Title :
3D imprint technology using SOG mold
Author :
Taniguchi, J. ; Iida, M. ; Takezawa, S. ; Kurashima, Y. ; Miyamoto, I. ; Komuro, M. ; Hiroshima, H. ; Matsui, S. ; Sakai, N. ; Tada, K.
Author_Institution :
Tokyo Univ. of Sci., Chiba, Japan
Abstract :
Nanoimprint lithography (NIL) provides a major breakthrough in nanopatterning because it produces nanometer features over a large area with high throughput and low cost. There are a lot of NIL studies, however, all of them are concerned with two dimensional pattern transfers. Fine three-dimensional (3D) fabrication process is now required and studied for various applications such as photonic crystals. In this work, we found out that Spin-On-Glass (SOG) behaves a positive-type-electron-beam (EB) resist using buffered HIP (BHF) development.
Keywords :
electron resists; nanolithography; spin coating; 3D imprint technology; SOG mold; Spin-On-Glass; high throughput; low cost; nanoimprint lithography; nanopatterning; photonic crystals; positive-type-electron-beam resist; two dimensional pattern transfers; Costs; Fabrication; Hafnium; Laboratories; Nanolithography; Nanopatterning; Photonic crystals; Resins; Resists; Throughput;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-031-3
DOI :
10.1109/IMNC.2002.1178597
