مرکز منطقه ای اطلاع رساني علوم و فناوري - Fabrication and Characterization of Silicon FEAs with Focusing Electrode by CMP Process

DocumentCode :

316529

Title :

Fabrication and Characterization of Silicon FEAs with Focusing Electrode by CMP Process

fYear :

1997

fDate :

17-21 Aug. 1997

Firstpage :

431

Lastpage :

435

Keywords :

Apertures; Dielectrics; Electrodes; Electron beams; Electron emission; Etching; Fabrication; Flat panel displays; Oxidation; Silicon;

fLanguage :

English

Publisher :

ieee

Conference_Titel :

Vacuum Microelectronics Conference, 1997. Technical Digest., 1997 10th International

Conference_Location :

Kyongju, Korea

Print_ISBN :

0-7803-3786-7

Type :

conf

DOI :

10.1109/IVMC.1997.627613

Filename :

627613

Link To Document :