Fabrication and Characterization of Silicon FEAs with Focusing Electrode by CMP Process

fYear

1997

fDate

17-21 Aug. 1997

Firstpage

431

Lastpage

435

Keywords

Apertures; Dielectrics; Electrodes; Electron beams; Electron emission; Etching; Fabrication; Flat panel displays; Oxidation; Silicon;

fLanguage

English

Publisher

ieee

Conference_Titel

Vacuum Microelectronics Conference, 1997. Technical Digest., 1997 10th International

Conference_Location

Kyongju, Korea

Print_ISBN

0-7803-3786-7

Type

conf

DOI

10.1109/IVMC.1997.627613

Filename

627613

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