Title :
Spray coated photoresist over anisotropically etched deep Si cavities
Author :
Singh, V.K. ; Sasaki, M. ; Jong Hyeong Song ; Hane, K.
Author_Institution :
Dept. of Mechatronics & Precision Eng., Tohoku Univ., Sendai, Japan
Abstract :
Up to now, we have demonstrated the lithography on the anisotropically wet-etched Si cavities and optical fiber ends. However the fundamental understanding or detailed data relating to the performance of the three-dimensional lithography are not clear. In this study, the photoresist thickness distribution is examined changing the resist drying condition.
Keywords :
elemental semiconductors; etching; photoresists; silicon; spray coatings; Si; anisotropic wet etching; deep silicon cavity; spray coated photoresist; three-dimensional lithography; Anisotropic magnetoresistance; Coatings; Etching; Fluid flow; Lithography; Mechatronics; Resists; Spraying; Surface tension; Temperature;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-031-3
DOI :
10.1109/IMNC.2002.1178607
