Fabrication of nano electron source using beam assisted process

Fabrication of a field emission electron source is a basic technology for vacuum micro electronics. There are various types of field emitter such as Spindt-type, Si-type, etc. Most of the electron sources have been fabricated using semiconductor process. In this study, a nano electron source has been fabricated using beam-assisted maskless processes. These processes use physical and chemical, reactions by electron beam (EB) or focused ion beam (FIB) with a Ga liquid metal ion source, moreover, a gate diameter and an emitter height can freely be fabricated using these processes.