DocumentCode
3165885
Title
Development of nitrogen-doped cobalt silicide film as the hinge material of a micromirror
Author
Jyh-Hua Ting ; Shiuann-Huah Shiau ; Yeong-Jyh Chen ; Bau-Tong Dai ; Fu-Ming Pan ; Wong, H. ; Pu, G.M. ; Chung-Yuan Kung
Author_Institution
Nat. Nano Device Labs., Hsinchu, Taiwan
fYear
2002
fDate
6-8 Nov. 2002
Firstpage
232
Lastpage
233
Abstract
The characteristics of hinge play an important role in the reliability and lifetime of a torsional micromirror. It is the purpose of this research to develop tough hinge material. To this purpose, nitrogen-doped cobalt silicide film (CoSi/sub x/N/sub y/) is sputtered from CoSi/sub 2/ target in Ar/N/sub 2/ discharge. Stress and sheet resistance of the CoSi/sub x/N/sub y/ film are evaluated.
Keywords
cobalt compounds; electrical resistivity; internal stresses; micromirrors; sputtered coatings; CoSiN; hinge material; nitrogen-doped cobalt silicide film; sheet resistance; sputter deposition; stress; torsional micromirror; Annealing; Ceramics; Cobalt; Compressive stress; Fasteners; Micromirrors; Optical films; Silicides; Tensile stress; Thermal stresses;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International
Conference_Location
Tokyo, Japan
Print_ISBN
4-89114-031-3
Type
conf
DOI
10.1109/IMNC.2002.1178629
Filename
1178629
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