• DocumentCode
    3166675
  • Title

    Practical, cost effective sub-wavelength lithography

  • Author

    Weed, J.T.

  • Author_Institution
    Numerical Technol. Inc., San Jose, CA, USA
  • fYear
    2002
  • fDate
    6-8 Nov. 2002
  • Firstpage
    296
  • Lastpage
    297
  • Abstract
    This paper will briefly examine the development of above-wavelength lithography, define the currently available optical extension techniques, explore the importance of integrating these techniques and offer a practical, cost effective approach capable of extending optical lithography to well below the 65 nm technology node.
  • Keywords
    nanolithography; photolithography; 65 nm; 65 nm technology node; cost effective sub-wavelength lithography; optical extension techniques; Costs; Inspection; Integrated optics; Lithography; Manufacturing processes; Optical materials; Physics; Pulp manufacturing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International
  • Conference_Location
    Tokyo, Japan
  • Print_ISBN
    4-89114-031-3
  • Type

    conf

  • DOI
    10.1109/IMNC.2002.1178660
  • Filename
    1178660
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3166675