Title :
Micro field emitter with nano-pillarets formed by RIE of photoresist
Author :
Baba, A. ; Yoshida, T. ; Asano, T.
Author_Institution :
Center for Microelectron. Syst., Kyushu Inst. of Technol., Fukuoka, Japan
Abstract :
We report for the first time the fabrication and emission characteristics of a gated micro-cold cathode whose emitter is made of nano-pillarets. We successfully fabricated the gated nano-pillarets emitter using a self-aligned formation process and the field electron emission from the gated emitter was demonstrated.
Keywords :
cathodes; electron field emission; photoresists; sputter etching; RIE; fabrication; field electron emission; gated micro-cold cathode; micro field emitter; reactive ion etching; self-aligned formation process; Apertures; Cathodes; Electrodes; Electron emission; Etching; Fabrication; Organic materials; Plasma displays; Resists; Voltage;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-031-3
DOI :
10.1109/IMNC.2002.1178678
