DocumentCode
3167918
Title
Design and fabrication of a three terminal quantum storage device
Author
Hartin, O.L. ; Neikirk, D.P. ; Anselm, A. ; Streetman, B.
Author_Institution
Microelectron. Res. Center, Texas Univ., Austin, TX, USA
fYear
1995
fDate
7-9 Aug 1995
Firstpage
209
Lastpage
218
Abstract
We have a significant new development in our group´s resonant tunneling diode memory switching devices that should enhance application in ultra-dense memory and logic. The original device, a double barrier resonant tunneling diode in the GaAs-AlAs materials system has shown multiple conduction states and memory switching in Schrodinger Poisson and Wigner formalism simulations, as well as in laboratory measurements. In new work we have demonstrated this phenomenon for similarly designed triple barrier resonant tunneling devices in Schrodinger Poisson simulations and in the laboratory. Memory switching has not been previously reported in these devices. The triple barrier device is part of our development of a three terminal quantum storage device which we believe will have significantly enhanced switching characteristics. The additional AlAs layer has been used as an etch stop in the fabrication of three terminal devices. A process has been developed using a suscinic acid selective etch to etch down to the top AlAs layer where metal is evaporated directly on the N+ layer forming a Schottky contact
Keywords
III-V semiconductors; aluminium compounds; etching; gallium arsenide; integrated logic circuits; integrated memory circuits; resonant tunnelling diodes; semiconductor device models; semiconductor quantum wells; semiconductor storage; semiconductor switches; GaAs-AlAs; N+ layer; RTD memory switching devices; Schottky contact; Schrodinger Poisson simulations; etch stop layer; fabrication; memory switching; modulation doped quantum well; multiple conduction states; resonant tunneling diode; suscinic acid selective etch; three terminal quantum storage device; triple barrier RTD; ultra-dense logic; ultra-dense memory; Conducting materials; Epitaxial layers; Etching; Fabrication; Gallium arsenide; Interference; Laboratories; Logic devices; Resonant tunneling devices; Schottky diodes;
fLanguage
English
Publisher
ieee
Conference_Titel
High Speed Semiconductor Devices and Circuits, 1995. Proceedings., IEEE/Cornell Conference on Advanced Concepts in
Conference_Location
Ithaca, NY
ISSN
1079-4700
Print_ISBN
0-7803-3970-3
Type
conf
DOI
10.1109/CORNEL.1995.482437
Filename
482437
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