Cascaded self-induced holography: a new fabrication technology for optoelectronics

Author

Lin, Chih-Hsien ; Zhu, Zuhua ; Lo, Yu-Hwa

Author_Institution

Sch. of Electr. Eng., Cornell Univ., Ithaca, NY, USA

fYear

1995

fDate

7-9 Aug 1995

Firstpage

388

Lastpage

397

Abstract

We present a new method of fabricating submicron gratings with a high filling factor for optoelectronic devices from a glass mask. The glass mask has gratings on both sides with a period of at least four times of the final feature size. By modifying the grating periods on both sides of the glass mask, one can achieve multiple-period gratings with a very fine period spacing for advanced wavelength division multiplexing (WDM) devices. In this paper, we demonstrate 0.5 μm second-order gratings for 1.55 μm distributed feedback (DFB) lasers and gratings with a 6 Å period difference for WDM laser arrays using only optical sources

Keywords

diffraction gratings; distributed feedback lasers; holographic interferometry; masks; optical fabrication; optoelectronic devices; photolithography; semiconductor laser arrays; semiconductor technology; wavelength division multiplexing; 0.5 micron; 1.55 micron; DFB lasers; WDM device fabrication; WDM laser arrays; cascaded self-induced holography; distributed feedback lasers; fabrication technology; glass mask; multiple-period gratings; optoelectronics; submicron gratings; wavelength division multiplexing; Distributed feedback devices; Filling; Glass; Gratings; Holography; Laser feedback; Optical arrays; Optical device fabrication; Optoelectronic devices; Wavelength division multiplexing;

fLanguage

English

Publisher

ieee

Conference_Titel

High Speed Semiconductor Devices and Circuits, 1995. Proceedings., IEEE/Cornell Conference on Advanced Concepts in

Conference_Location

Ithaca, NY

ISSN

1079-4700

Print_ISBN

0-7803-3970-3

Type

conf

DOI

10.1109/CORNEL.1995.482532

Filename

482532