DocumentCode :
3170349
Title :
Applying Line, Offset-Series, Offset-Shunt calibration for on-wafer CMOS device characterizations
Author :
Huang, Chien-Chang ; Chang-Chien, Min-Yu ; Hsu, Yu-Cheng ; Ku, Kai-Wei
Author_Institution :
Dept. of Commun. Eng., Yuan Ze Univ., Chungli, Taiwan
fYear :
2009
fDate :
7-10 Dec. 2009
Firstpage :
417
Lastpage :
420
Abstract :
This paper presents a new calibration method using line, offset-series, offset-shunt standards for microwave scattering parameter measurements with applications of CMOS on-wafer device characterizations. The modifications of the reference planes for the series and the shunt standards avoid the ill-conditioned problem for the self-calibration equations as the phase shift of the line standard approaching 180 degrees. The measurement results are shown for an NMOS FET in TSMC CMOS 0.18 ¿m technology from 2 GHz to 60 GHz with comparisons of TRL calibration method.
Keywords :
CMOS integrated circuits; MOSFET; S-parameters; calibration; NMOS FET; NMOS microwave scattering parameter measurements; frequency 2 GHz to 60 GHz; offset-series calibration; offset-shunt calibration; on-wafer CMOS device characterizations; size 0.18 mum; CMOS technology; Calibration; Equations; FETs; MOS devices; Measurement standards; Microwave devices; Microwave measurements; Microwave theory and techniques; Scattering parameters; Scattering parameters; calibration; de-embedding; on-wafer measurements; vector network analyzer;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Conference, 2009. APMC 2009. Asia Pacific
Conference_Location :
Singapore
Print_ISBN :
978-1-4244-2801-4
Electronic_ISBN :
978-1-4244-2802-1
Type :
conf
DOI :
10.1109/APMC.2009.5384512
Filename :
5384512
Link To Document :
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