Multiwavelength lasers on a chip

Author

Kobayashi, Kohroh ; Mito, Lkuo

Author_Institution

Opto-Electron. Res. Labs., NEC Corp., Tsukuba, Japan

Volume

1

fYear

1997

fDate

10-13 Nov 1997

Firstpage

65

Abstract

In this paper, new technologies will be described to develop WDM laser diodes (LD)s at a reasonable cost by simultaneous fabrication of multiwavelength lasers on a chip or on a wafer. The necessary pitch corrugation formation for DFB or DBR semiconductor lasers on the same wafer has been successfully demonstrated by applying new and precise computer-controlled electron beam (EB) lithography

Keywords

diffraction gratings; distributed Bragg reflector lasers; distributed feedback lasers; electron beam lithography; optical fabrication; optical transmitters; semiconductor lasers; semiconductor technology; wavelength division multiplexing; DBR semiconductor lasers; DFB semiconductor lasers; WDM laser diodes; chip; multiwavelength lasers; pitch corrugation formation; precise computer-controlled electron beam lithography; reasonable cost; simultaneous fabrication; wafer; Costs; Epitaxial growth; Epitaxial layers; Fiber lasers; Gratings; Light sources; Lithography; Optical fiber communication; Semiconductor lasers; Wavelength division multiplexing;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics Society Annual Meeting, 1997. LEOS '97 10th Annual Meeting. Conference Proceedings., IEEE

Conference_Location

San Francisco, CA

ISSN

1092-8081

Print_ISBN

0-7803-3895-2

Type

conf

DOI

10.1109/LEOS.1997.630519

Filename

630519