Novel oxide multilayer reflectors for “water-window” wavelengths fabricated by atomic layer deposition

Author

Kumagai, Hiroshi ; Obara, Minoru

Author_Institution

RIKEN, Inst. of Phys. & Chem. Res., Saitama, Japan

Volume

1

fYear

1997

fDate

10-13 Nov 1997

Firstpage

102

Abstract

In this paper, we report that we could demonstrate experimentally high reflectance (71.8°) over 30% for soft X-ray multilayer mirrors, at 2.734 nm near the titanium L_2,3 absorption edge located at 2.729 nm, by novel metal oxide multilayers of titanium oxide and aluminum oxide fabricated by the atomic layer deposition method

Keywords

X-ray optics; alumina; atomic layer epitaxial growth; mirrors; optical fabrication; optical films; reflectivity; titanium compounds; 2.729 nm; 2.734 nm; TiO₂-Al₂O₃; aluminum oxide; atomic layer deposition; atomic layer deposition method; high reflectance; metal oxide multilayers; oxide multilayer reflectors; soft X-ray multilayer mirrors; titanium L_2,3 absorption edge; titanium oxide; water-window wavelengths; Absorption; Aluminum oxide; Atomic layer deposition; Electron beams; Infrared heating; Magnetic multilayers; Nonhomogeneous media; Reflectivity; Sputtering; Titanium;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics Society Annual Meeting, 1997. LEOS '97 10th Annual Meeting. Conference Proceedings., IEEE

Conference_Location

San Francisco, CA

ISSN

1092-8081

Print_ISBN

0-7803-3895-2

Type

conf

DOI

10.1109/LEOS.1997.630538

Filename

630538