DocumentCode :
317113
Title :
Novel oxide multilayer reflectors for “water-window” wavelengths fabricated by atomic layer deposition
Author :
Kumagai, Hiroshi ; Obara, Minoru
Author_Institution :
RIKEN, Inst. of Phys. & Chem. Res., Saitama, Japan
Volume :
1
fYear :
1997
fDate :
10-13 Nov 1997
Firstpage :
102
Abstract :
In this paper, we report that we could demonstrate experimentally high reflectance (71.8°) over 30% for soft X-ray multilayer mirrors, at 2.734 nm near the titanium L2,3 absorption edge located at 2.729 nm, by novel metal oxide multilayers of titanium oxide and aluminum oxide fabricated by the atomic layer deposition method
Keywords :
X-ray optics; alumina; atomic layer epitaxial growth; mirrors; optical fabrication; optical films; reflectivity; titanium compounds; 2.729 nm; 2.734 nm; TiO2-Al2O3; aluminum oxide; atomic layer deposition; atomic layer deposition method; high reflectance; metal oxide multilayers; oxide multilayer reflectors; soft X-ray multilayer mirrors; titanium L2,3 absorption edge; titanium oxide; water-window wavelengths; Absorption; Aluminum oxide; Atomic layer deposition; Electron beams; Infrared heating; Magnetic multilayers; Nonhomogeneous media; Reflectivity; Sputtering; Titanium;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics Society Annual Meeting, 1997. LEOS '97 10th Annual Meeting. Conference Proceedings., IEEE
Conference_Location :
San Francisco, CA
ISSN :
1092-8081
Print_ISBN :
0-7803-3895-2
Type :
conf
DOI :
10.1109/LEOS.1997.630538
Filename :
630538
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=317113
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