DocumentCode
317114
Title
EUV laboratory polarimetry and ellipsometry with a laser produced plasma source
Author
Yamamoto, Masaki ; Furudate, Minaji ; Mayama, Ko ; Yanagihara, Mihiro ; Watanabe, Makoto
Author_Institution
Res. Inst. for Sci. Meas., Tohoku Univ., Sendai, Japan
Volume
1
fYear
1997
fDate
10-13 Nov 1997
Firstpage
104
Abstract
This paper describes the first laboratory EUV ellipsometer developed with the multilayer polarization elements installed in the optical path of our EUV reflectometer, and also some examples of ellipsometry and polarimetry measurements
Keywords
X-ray optics; ellipsometry; optical films; optical polarisers; plasma production by laser; polarimetry; reflectivity; synchrotron radiation; EUV laboratory polarimetry; EUV reflectometer; ellipsometry measurements; laser produced plasma source; multilayer polarization elements; optical path; soft X-ray ellipsometry; soft X-ray polarimetry measurements; Ellipsometry; Laboratories; Light sources; Nonhomogeneous media; Optical polarization; Plasma measurements; Plasma sources; Polarimetry; Synchrotron radiation; Ultraviolet sources;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics Society Annual Meeting, 1997. LEOS '97 10th Annual Meeting. Conference Proceedings., IEEE
Conference_Location
San Francisco, CA
ISSN
1092-8081
Print_ISBN
0-7803-3895-2
Type
conf
DOI
10.1109/LEOS.1997.630540
Filename
630540
Link To Document