Title :
EUV laboratory polarimetry and ellipsometry with a laser produced plasma source
Author :
Yamamoto, Masaki ; Furudate, Minaji ; Mayama, Ko ; Yanagihara, Mihiro ; Watanabe, Makoto
Author_Institution :
Res. Inst. for Sci. Meas., Tohoku Univ., Sendai, Japan
Abstract :
This paper describes the first laboratory EUV ellipsometer developed with the multilayer polarization elements installed in the optical path of our EUV reflectometer, and also some examples of ellipsometry and polarimetry measurements
Keywords :
X-ray optics; ellipsometry; optical films; optical polarisers; plasma production by laser; polarimetry; reflectivity; synchrotron radiation; EUV laboratory polarimetry; EUV reflectometer; ellipsometry measurements; laser produced plasma source; multilayer polarization elements; optical path; soft X-ray ellipsometry; soft X-ray polarimetry measurements; Ellipsometry; Laboratories; Light sources; Nonhomogeneous media; Optical polarization; Plasma measurements; Plasma sources; Polarimetry; Synchrotron radiation; Ultraviolet sources;
Conference_Titel :
Lasers and Electro-Optics Society Annual Meeting, 1997. LEOS '97 10th Annual Meeting. Conference Proceedings., IEEE
Conference_Location :
San Francisco, CA
Print_ISBN :
0-7803-3895-2
DOI :
10.1109/LEOS.1997.630540
