DocumentCode :
3171250
Title :
A system to deposit boron films (boronization) in the DIII-D tokamak
Author :
Hodapp, T.R. ; Jackson, G.L. ; Phillips, J. ; Holtrop, K.L. ; Petersen, P.I. ; Winter, J.
Author_Institution :
General Atomics, San Diego, CA, USA
fYear :
1991
fDate :
30 Sep-3 Oct 1991
Firstpage :
392
Abstract :
A system has been added to the DIII-D tokamak to coat its plasma facing surfaces with a film of boron using diborane gas. The system includes special health and safety equipment for handling the diborane gas, which is toxic and inflammable. The purpose of the boron film is to reduce the levels of impurity atoms in the DIII-D plasmas. Experiments following the application of the boron film in DIII-D have led to significant reductions in plasma impurity levels and the observation of a new, very high confinement regime
Keywords :
boron; fusion reactor materials; fusion reactor safety; fusion reactor theory and design; plasma impurities; plasma toroidal confinement; surface hardening; thin films; B film; DIII-D tokamak; boronization; diborane gas; handling; health; impurity atoms; inflammable; plasma facing surfaces; plasma impurity levels; safety equipment; toxic; very high confinement regime; Atomic measurements; Boron; Helium; Impurities; Plasma applications; Plasma chemistry; Plasma confinement; Plasma density; Plasma sources; Tokamaks;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Fusion Engineering, 1991. Proceedings., 14th IEEE/NPSS Symposium on
Conference_Location :
San Diego, CA
Print_ISBN :
0-7803-0132-3
Type :
conf
DOI :
10.1109/FUSION.1991.218796
Filename :
218796
Link To Document :
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