DocumentCode
3171521
Title
Trimming analog circuits using floating-gate analog MOS memory
Author
Carley, L.R.
Author_Institution
Carnegie-Mellon Univ., Pittsburgh, PA, USA
fYear
1989
fDate
15-17 Feb. 1989
Firstpage
202
Lastpage
203
Abstract
The author presents an analog trim-voltage memory (ATVM) which employs a floating-gate MOS structure similar to that used in digital electrically erasable and programmable read-only memories (EEPROMs). The ATVM is suitable for trimming the offset voltages and currents resulting from threshold mismatches in analog circuits such as operational amplifiers and comparators. It can be incorporated into a standard digital CMOS process without the additional processing steps typically needed for EEPROM fabrication. This floating-gate memory uses hot-electron injection to decrease the floating-gate voltage and electron tunneling from the floating gate to increase the voltage. A possible use of the ATVM circuit is shown along with the input stage of a two-stage Miller compensated op amp.<>
Keywords
CMOS integrated circuits; analogue storage; integrated memory circuits; ATVM; an analog trim-voltage memory; analogue circuits trimming; application; electron tunneling; floating gate voltage adjustment; floating-gate MOS structure; floating-gate analog MOS memory; floating-gate memory; hot-electron injection; offset current trimming; offset voltage trimming; standard digital CMOS process; two-stage Miller compensated op amp; Analog circuits; CMOS process; EPROM; Fabrication; Nonvolatile memory; Operational amplifiers; PROM; Secondary generated hot electron injection; Threshold voltage; Tunneling;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Circuits Conference, 1989. Digest of Technical Papers. 36th ISSCC., 1989 IEEE International
Conference_Location
New York, NY, USA
Type
conf
DOI
10.1109/ISSCC.1989.48260
Filename
48260
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