DocumentCode
3172039
Title
Theoretical study of effect of position of dopant in a channel for nano scale devices
Author
Lamba, V.K. ; Engles, Derick ; Malik, S.S.
Author_Institution
Haryana Coll. of Technol., Haryana
fYear
2007
fDate
16-20 Dec. 2007
Firstpage
247
Lastpage
249
Abstract
As the number of parameters such as carrier confinement, effects of parallel and transverse field- dependent mobility, carrier scattering due to Coulomb effects, acoustic phonons, impurity doping profile and surface roughness influences the transport process in the channel region. The simplest model of quantum transport in nano-devices is to describe the problem in terms of the scattering of the electron wave-function by a spatially varying potential. Here, we assume that this potential is situated between two electron reservoirs, each of which emits particles with an equilibrium distribution into the scattering region which is doped by impurity. As the reservoirs will, in general, have different chemical potentials, their difference representing an applied bias voltage. The net flux of electrons passing between the reservoirs constitutes the electrical current conducted by the device.
Keywords
carrier mobility; chemical potential; impurity scattering; nanoelectronics; semiconductor doping; wave functions; channel mobility; chemical potentials; electron reservoirs; electron wave-function; impurity doping; nanoscale devices; quantum transport; spatially varying potential; Acoustic devices; Acoustic scattering; Carrier confinement; Doping profiles; Electrons; Impurities; Particle scattering; Phonons; Reservoirs; Scattering parameters; Carrier Scattering; Doping Profile; Mobility;
fLanguage
English
Publisher
ieee
Conference_Titel
Physics of Semiconductor Devices, 2007. IWPSD 2007. International Workshop on
Conference_Location
Mumbai
Print_ISBN
978-1-4244-1728-5
Electronic_ISBN
978-1-4244-1728-5
Type
conf
DOI
10.1109/IWPSD.2007.4472492
Filename
4472492
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