• DocumentCode
    3173028
  • Title

    High-performance SiGe power HBTs with wide emitter stripes

  • Author

    Wang, Guogong ; Yuan, Hao-Chih ; Ma, Zhenqiang

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Wisconsin-Madison Univ., Madison, WI
  • fYear
    2006
  • fDate
    18-20 Jan. 2006
  • Abstract
    Common-emitter and common-base SiGe power heterojunction bipolar transistors (PHBTs) with 2mum and 3mum emitter stripe widths have been fabricated and compared. The reduced base pinch resistance resulting from using a heavily doped base region has enabled excellent and equivalent RF performance from SiGe PHBTs of different emitter stripe widths. However, the total device area is saved by using wider emitter stripes. The current device design approach can help reduce the fabrication cost of SiGe PHBTs and make them more competitive than other existing technologies for microwave and RF power applications
  • Keywords
    Ge-Si alloys; heterojunction bipolar transistors; power bipolar transistors; 2 micron; 3 micron; SiGe; base pinch resistance; emitter stripes; power heterojunction bipolar transistors; Costs; Doping profiles; Fabrication; Gallium arsenide; Germanium silicon alloys; Heterojunction bipolar transistors; Millimeter wave technology; Proximity effect; Radio frequency; Silicon germanium;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Silicon Monolithic Integrated Circuits in RF Systems, 2006. Digest of Papers. 2006 Topical Meeting on
  • Conference_Location
    San Diego, CA
  • Print_ISBN
    0-7803-9472-0
  • Type

    conf

  • DOI
    10.1109/SMIC.2005.1587981
  • Filename
    1587981